SUPERCAPACITOR BEHAVIOR OF SPRAY DEPOSITED SnO2 THIN FILMS

Author:

VIJAYAKUMAR S.1,NAGAMUTHU S.1,PURUSHOTHAMAN K. K.2,DHANASHANKAR M.3,MURALIDHARAN G.1

Affiliation:

1. Department of Physics, Gandhigram Rural University, Gandhigram 624302, Tamilnadu, India

2. Department of Physics, TRP Engineering College (SRM Group), Irungalur, Trichy, India

3. Department of Physics, Kamaraj College of Engineering and Technology, Virudhunagar 626 001, India

Abstract

Tin oxide thin films were prepared via spray pyrolysis method. The structural and morphological properties of SnO2 thin films have been investigated using X-ray diffraction (XRD) and scanned electron microscope (SEM) analysis. The XRD pattern confirms the tetragonal rutile structure of SnO2 with preferential orientation along (200) plane. SEM image reveals the nanocrystalline nature of the SnO2 films. SnO2 thin films were subjected to electrochemical tests to study the supercapacitor behavior. Maximum specific capacitance of 168 F/g at a scan rate of 25 mV/s was obtained using 0.5 M KOH as the electrolyte. This is the highest value ever reported for spray deposited tin oxide thin films.

Publisher

World Scientific Pub Co Pte Lt

Subject

Electrical and Electronic Engineering,Computer Science Applications,Condensed Matter Physics,General Materials Science,Bioengineering,Biotechnology

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