AC IMPEDANCE STUDY OF PATTERN FORMATION OF SILVER ELECTRODEPOSITS
Affiliation:
1. Institute for Materials Research, Tohoku University, Katahira, Sendai 980-77, Japan
Abstract
Electrochemical impedance was examined in the two-dimensional growth of Ag electrodeposits to investigate the rate-determining step in the pattern formation of the aggregates. The frequency dispersions of the in-situ ac impedance during the electrodeposition demonstrated that the open-ramified growth is diffusion-limited, the dendritic growth is reaction-limited, the homogeneous growth is electric-migration-limited and the DBM (dense branching morphology) growth is both diffusion and electric-migration controlled.
Publisher
World Scientific Pub Co Pte Lt
Subject
Applied Mathematics,Geometry and Topology,Modeling and Simulation