Blue shift in the optical bandgap of tin oxide thin films by controlling oxygen-to-argon gas flow ratio

Author:

Meenakshi 1,Gautam Sanjeev23,Chae Keun Hwa2,Lee Ik-Jae4,Shin Hyun-Joon4,Thakur Anup5

Affiliation:

1. Department of Electronic & Communication Engineering, Punjabi University, Patiala 147-002, Punjab, India

2. Advanced Analysis Center, Korea Institute of Science and Technology, Seoul 136-791, South Korea

3. Dr. S S Bhatnagar, University Institute of Chemical Engineering & Technology, Panjab University, Chandigarh 160-014, India

4. Beamline Research Division, Pohang Accelerator Lab., San31, Hyojadong, Namgu, Pohang 790-784, South Korea

5. Advanced Materials Research Lab, Department of Basic and Applied Sciences, Punjabi University, Patiala 147-002, Punjab, India

Abstract

Tin oxide ( SnO 2) thin films were deposited by radio-frequency (RF) magnetron sputtering on silicon and glass substrates at different oxygen-to-argon gas-flow ratio ( O 2-to- Ar = 0%, 10%, 20%, 30% and 50%). All films were deposited at room temperature and fixed working pressures, 10 mTorr. X-ray diffraction (XRD) measurement suggests that all films were crystalline in nature except film deposited only in argon environment. The transparency of all of the films was more than 85% in the visible range except the film deposited only in the argon environment. Atomic force microscopy results showed that the surface of all the films were highly flat and smooth. The optical bandgap, estimated by Tauc plot was increased with oxygen environment. Blue shift was observed in the absorption edge and was accounted to decrease in the oxygen vacancies and dangling bonds.

Publisher

World Scientific Pub Co Pte Lt

Subject

General Materials Science

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