Electroplating of copper/microdiamond composites and the effect of diamond surface functionalization

Author:

Naruse Yuto1,Park Jae-Hyeok1,Hagio Tkeshi2ORCID,Kamimoto Yuki2,Ichino Ryoichi2,Bessho Takeshi3

Affiliation:

1. Department of Chemical Systems Engineering, Graduate School of Engineering, Nagoya University, Nagoya 464-8603, Japan

2. Institute of Materials Innovation, Institutes of Innovation for Future Society, Nagoya University, Nagoya 464-8601, Japan

3. Toyota Motor Corporation, Toyota, 471-8571, Japan

Abstract

Compositing diamonds with high thermally conductive metals, such as copper, have attracted much attention in recent years. In this study, we prepared copper/diamond composites by electroplating and investigated the effect of the surface functionalization of diamond on the interfacial adhesion of copper and diamond in the composite. Oxygen-containing groups were introduced on the diamond surface by a hydrothermal treatment and amino groups were further introduced using a silane coupling agent. Surface functionalization of diamond with both these groups led to drastically increased wettability against the copper sulfate solution and improved the interfacial adhesion of copper and diamond in the composite. Compared with that of the plating based on pristine diamond, the thermal conductivity of the platings based on diamond functionalized with oxygen-containing groups and amino groups increased by 42 and 31 W m[Formula: see text] K[Formula: see text], respectively. Thus, diamond surface functionalization effectively improved the adhesion at the copper/diamond interface in electroplated copper/diamond composites.

Funder

Program on Open Innovation Platform with Enterprises, Research Institute and Academia

Publisher

World Scientific Pub Co Pte Lt

Subject

General Materials Science

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