Kinetic Monte Carlo simulation of random deposition and scaling behavior with respect to the germination length

Author:

Saoudi Abdenour1,Aissani Linda23,Sorba Grégoire4,Chinesta Francisco5

Affiliation:

1. Mechanical Engineering Department, Abbes Laghrour-Khenchela University, P.O. Box 1252, Khenchela 40004, Algeria

2. Laboratory of Active Components and Materials, Larbi Ben M’Hidi University, Oum El Bouaghi, Algeria

3. Mater Science Department, Abbes Laghrour-Khenchela University, P.O. Box 1252, Khenchela 40004, Algeria

4. École Supérieure des Techniques Aéronautiques et Construction Automobile, 12 Avenue Paul Delouvrier, 78180 Montigny-le-Bretonneux, France

5. PIMM Lab & ESI Chair, Arts et Metiers Institute of Technology, 151 Boulevard de l’Hôpital, 73013 Paris, France

Abstract

This work aims at analyzing the scaling behavior and develop correlations during surface growing for different germination lengths. The surface growing by random deposition is simulated using a kinetic Monte Carlo approach, by considering different germination lengths. Different surface descriptors are extracted, among them the roughness and the correlation. The former allows extracting the scaling behavior, while the latter proves the existence of correlations independent of the system size but dependent on the germination length. Moreover, as in the case of random deposition with a null germination length, the growing roughness never saturates.

Publisher

World Scientific Pub Co Pte Lt

Subject

Computer Science Applications,Mechanics of Materials,General Materials Science,Modelling and Simulation,Numerical Analysis

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