Enhanced CO2 Reduction to Ethylene with Hollow Cu2O Structure by Facet-Controlled Etching

Author:

Li Jing12,Meng Chen2,Wang Honglin2,Lin Rui3,Wang Min2,Zhu Hongwei2

Affiliation:

1. State Key Laboratory of Solid Waste Reuse for Building Materials, Beijing Building Materials Academy of Science Research, Beijing 100041, P. R. China

2. State Key Lab of New Ceramics and Fine Processing, School of Materials Science and Engineering, Tsinghua University, Beijing 100084, P. R. China

3. Department of Chemistry, Tsinghua University, Beijing 100084, P. R. China

Abstract

Various catalysts have been used for achieving the CO2 reduction reaction (CO2RR), among which Cu2O has received widespread attention due to its high activity and selectivity. In this work, we focus on the morphology control of Cu2O nanoboxes (NBs) regulated by poly (vinyl pyrrolidone) and graphene oxide and report the synthesis of a hollow structure by facet-controlled etching. Cu2O NBs etched for 8 days exhibited enhanced CO2RR selectivity and activity, reaching a superior C2H4 Faraday efficiency of [Formula: see text]35.4% at −1.2 V (versus Ag/AgCl), which was much higher than that of unetched catalysts. The improved performance was attributed to the synergistic effect of various crystal facets exposed on the NB surface. The hollow NBs showed relatively high structural stability, demonstrating the potential for practical applications. This study introduces an efficient approach to boost the catalyst properties by specifically constructing the structure and controlling the morphology.

Publisher

World Scientific Pub Co Pte Ltd

Subject

Condensed Matter Physics,General Materials Science

同舟云学术

1.学者识别学者识别

2.学术分析学术分析

3.人才评估人才评估

"同舟云学术"是以全球学者为主线,采集、加工和组织学术论文而形成的新型学术文献查询和分析系统,可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容,当前同舟云学术共收录了国内外主流学术期刊6万余种,收集的期刊论文及会议论文总量共计约1.5亿篇,并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询!咨询电话:010-8811{复制后删除}0370

www.globalauthorid.com

TOP

Copyright © 2019-2024 北京同舟云网络信息技术有限公司
京公网安备11010802033243号  京ICP备18003416号-3