IMPRINT-MOLD-CLEANING BY VACUUM ULTRAVIOLET LIGHT-Reference-Cited by-同舟云学术

IMPRINT-MOLD-CLEANING BY VACUUM ULTRAVIOLET LIGHT

Published:2010-12 Issue:04 Volume:19 Page:773-779
ISSN:0218-8635
Container-title:Journal of Nonlinear Optical Physics & Materials
language:en
Short-container-title:J. Nonlinear Optic. Phys. Mat.

Author:

NAKAO MASASHI¹,YAMAGUCHI MASANORI²,YABU SHINTARO²

Affiliation:

1. Nano ICT Group, Kobe Advanced ICT Research Center, National Institute of Information and Communications Technology, 588-2 Iwaoka, Iwaka-cho, Nishi-ku, Kobe, 651-2492, Japan

2. Project Promotion Department, Photon Process BU, Ushio Inc., 1194 Sazuchi, Bessho-cho, Himeji, 671-0224, Japan

Abstract

Imprinted molds which are contaminated by organic substances such as UV-resins through many times of imprinting processes are successfully cleaned with irradiation of a vacuum ultraviolet (VUV, λ = 172 nm) light. Substrate temperature, radiation distance, and ambient oxygen concentration are also revealed as important factors to clean the molds.

Publisher

World Scientific Pub Co Pte Lt

Subject

Physics and Astronomy (miscellaneous),Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials

Link

https://www.worldscientific.com/doi/pdf/10.1142/S0218863510005698

Reference5 articles.

1. Imprint of sub‐25 nm vias and trenches in polymers

2. A Study of Photoresist Pattern Freezing for Double Imaging using 172nm VUV Flood Exposure

3. Direct nano-printing on Al substrate using a SiC mold

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