All-dielectric high saturation structural colors with Si3N4 metasurface

Abstract

Structural colors engineering as a promising research area provides a high-resolution and environmental-friendly sustainable colors implementation. Here, metasurface-based concept was used to design waveguides and gratings of Si3N4 material on silicon dioxide substrates. The shift of reflection peaks can be controlled by structural parameters and efficiencies exceeded 90% with half height and width less than 10 nm. This induced structural color with superior saturation. Moreover, such nanostructures showed good sensitivity to polarization angle and incident angle of incident light. The proposed coloring devices look promising for applications in active color displays, imaging devices, and anti-counterfeiting and so on.