The effect of Er doping on the crystallization of Ge1−xSnx thin films

Author:

Xia Baijie12,Dong Zhaoshi1ORCID,Zhao Chunwang1

Affiliation:

1. College of Arts and Sciences, Shanghai Maritime University, Shanghai 201306, China

2. Merchant Marine College, Shanghai Maritime University, Shanghai 201306, China

Abstract

The Er-doped [Formula: see text] thin films with different Sn contents were prepared on Ge buffered Si substrates by thermal evaporation. The effect of Er doping on the crystallization of [Formula: see text] films at different annealing temperatures was studied. It is demonstrated that Er doping can increase the critical crystallization temperature and greatly reduce the surface roughness of high temperature annealed [Formula: see text] thin films.

Funder

National Natural Science Foundation of China

Publisher

World Scientific Pub Co Pte Lt

Subject

Condensed Matter Physics,Statistical and Nonlinear Physics

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