VAPOR-REDISSOLUTION TECHNIQUE FOR REDUCTION OF POLYMER/Si ARRAYED WAVEGUIDE GRATING LOSS

Author:

ZHANG HAIMING1,ZHANG DAMING1,QIN ZHENKUN12,MA CHUNSHENG2

Affiliation:

1. State Key Laboratory on Integrated Optoelectronics, College of Electronic Science and Engineering, Jilin University, 2699 Qianjin Street, Changchun 130012, China

2. Jilin Normal University, Siping 136000, China

Abstract

An efficient vapor-redissolution technique is used to greatly reduce sidewall scattering loss in the polymer arrayed waveguide grating (AWG) fabricated on a silicon substrate. Smoother sidewalls are achieved and verified by scanning electron microscopy. Reduction of sidewall scattering loss is further measured for the loss measurement of both straight waveguides and AWG devices. The sidewall loss in straight polymer waveguide is decreased by 2.1 dB/cm, the insertion loss of our AWG device is reduced by about 5.5 dB for the central channel and 6.7 dB for the edge channels, the crosstalk is reduced by 2.5 dB, and 3-dB bandwidth is narrowed by 0.05 nm after the vapor-redissoluton treatment.

Publisher

World Scientific Pub Co Pte Lt

Subject

Condensed Matter Physics,Statistical and Nonlinear Physics

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