Magnetic Properties of FeNi Films Prepared by Oblique Deposition at Different Growth Conditions

Abstract

FeNi films were prepared by oblique deposition onto glass substrate using magnetron sputtering deposition technique. The deposition was carried out on a rotating or nonrotating substrate with or without a constant magnetic field applied parallel to the substrate plane. The magnetic properties of the samples were measured by a magneto-optical Kerr effect at room temperature. All films had in-plane uniaxial magnetic anisotropy. The presence of in-plane magnetic anisotropy was also confirmed by the features of the domain structure. The main factor determining the orientation of the induced anisotropy axis of films was the magnetic field applied during deposition.