Development of a high-current microbeam system-Reference-Cited by-同舟云学术

Development of a high-current microbeam system

Published:2014-01 Issue:03n04 Volume:24 Page:101-110
ISSN:0129-0835
Container-title:International Journal of PIXE
language:en
Short-container-title:Int. J. PIXE

Author:

Matsuyama S.¹,Ishii K.¹,Suzuki S.¹,Terakawa A.¹,Fujiwara M.¹,Koshio S.¹,Toyama S.¹,Ito S.¹,Fujisawa M.¹,Nagaya T.¹

Affiliation:

1. Department of Quantum Science and Energy Engineering, Tohoku University, Aramaki-aza-Aoba 6-6-01-2, Aoba-ku, Sendai 980-8579, Japan

Abstract

We report on the development of a high-current microbeam system for wavelength-dispersive X-ray micro particle-induced X-ray emission (WDX-[Formula: see text]-PIXE) for chemical state mapping. The microbeam system is composed of two slits and a quadrupole doublet lens mounted on a heavy rigid support. The microbeam system is installed immediately after a switching magnet. A beam brightness of [Formula: see text] is obtained at a half-divergence of 0.1 mrad. A beam current of more than 300 pA is obtained for object sizes of [Formula: see text] with a half-divergence of 0.2 mrad, which corresponds to a beam spot size of [Formula: see text]. The calculated spot size of the beam was [Formula: see text] and the measured spot size was [Formula: see text]. The WDX-[Formula: see text]-PIXE system with the microbeam system is now operational.

Publisher

World Scientific Pub Co Pte Lt

Link

https://www.worldscientific.com/doi/pdf/10.1142/S0129083514400038

Reference10 articles.

1. Preliminary results of microbeam at Tohoku University

2. Progress and application of the Tohoku microbeam system

3. Röntgenspektroskopie und Abbildung mittels gekrümmter Kristallreflektoren

4. Improvement and recent applications of the Tohoku microbeam system

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