Effect of (Al3+/Ta5+) co-doped on dielectric properties of CdCu3Ti4O12 ceramics

Author:

Liu Huan1,Peng Zhanhui1ORCID,Chen Yulin1,Chen Bi2,Wu Di1,Wei Lingling3,Liang Pengfei4,Chao Xiaolian1ORCID,Yang Zupei1ORCID

Affiliation:

1. Key Laboratory for Macromolecular Science of Shaanxi Province, Shaanxi Key Laboratory for Advanced Energy Devices, Shaanxi Engineering Laboratory for Advanced Energy Technology, School of Materials Science and Engineering, Shaanxi Normal University, Xi’an 710062, Shaanxi, P. R. China

2. School of Chemistry and Chemical Engineering, Yulin University, Xi’an 719000, Shaanxi, P. R. China

3. School of Chemistry and Chemical Engineering, Shaanxi Normal University, Xi’an 710062, Shaanxi, P. R. China

4. School of Physics and Information Technology, Shaanxi Normal University, Xi’an 710062, Shaanxi, P. R. China

Abstract

In this work, dense CdCu3(Al[Formula: see text]Ta[Formula: see text]Ti[Formula: see text]O[Formula: see text] ceramics were prepared by a conventional solid phase method. The effect of Al[Formula: see text]/Ta[Formula: see text] dopants on the dielectric properties of CdCu3Ti4O[Formula: see text] ceramics was systematically investigated. Upon Al[Formula: see text]/Ta[Formula: see text] co-doping, the dielectric properties of CdCu3(Al[Formula: see text]Ta[Formula: see text]Ti[Formula: see text]O[Formula: see text] were significantly enhanced. Particularly, the CdCu3(Al[Formula: see text]Ta[Formula: see text]Ti[Formula: see text]O[Formula: see text] material displays a decent dielectric property, where dielectric constants ([Formula: see text]), loss tangent (tan [Formula: see text]) at a test frequency of 1[Formula: see text]kHz are able to satisfy the application temperature requirement of the Y6R capacitor. Surprisingly, the refined grains resulting from Al[Formula: see text]/Ta[Formula: see text] co-doping lead to heightened resistance at grain boundaries, which is closely associated with enhanced dielectric properties. Meanwhile, the giant dielectric property of the materials can be attributed to the effect of the internal barrier layer capacitance. The obtained results are expected to provide a new idea for obtaining high dielectric constant and low loss tangent in CdCTO-based materials and promote the practical application of such materials.

Funder

National Science Foundation of China

Excellent Graduate Training Program of Shaanxi Normal University

Publisher

World Scientific Pub Co Pte Ltd

同舟云学术

1.学者识别学者识别

2.学术分析学术分析

3.人才评估人才评估

"同舟云学术"是以全球学者为主线,采集、加工和组织学术论文而形成的新型学术文献查询和分析系统,可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容,当前同舟云学术共收录了国内外主流学术期刊6万余种,收集的期刊论文及会议论文总量共计约1.5亿篇,并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询!咨询电话:010-8811{复制后删除}0370

www.globalauthorid.com

TOP

Copyright © 2019-2024 北京同舟云网络信息技术有限公司
京公网安备11010802033243号  京ICP备18003416号-3