GROWTH AND CHARACTERIZATION OF SILICON CARBIDE NANOWIRES

Author:

PARK BYOUNGTAE1,RYU YONGHWAN1,YONG KIJUNG1

Affiliation:

1. Surface Chemistry Laboratory of Electronic Materials, Department of Chemical Engineering, Pohang, University of Science and Technology (POSTECH), Pohang 790-784, Korea

Abstract

A simple, direct synthesis method was used to grow the core-shell SiC - SiOx nanowires by heating the NiO catalyzed silicon substrate. The carbothermal reduction of WO3 by C provided a reductive environment to synthesize the crystalline SiC nanowires covered with the SiO x sheath in the growth temperature of 1000–1100°C. After hydrofluoric acid (HF) etching, the cubic β- SiC nanowires were extracted from the core-shell nanowires in large quantities. A solid-liquid-solid (SLS) mechanism was proposed for the growth of the core-shell SiC - SiO x nanowires.

Publisher

World Scientific Pub Co Pte Lt

Subject

Materials Chemistry,Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics

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