INFLUENCE OF PLASMA PRETREATMENT IN THE FORMATION OF DIAMOND-LIKE CARBON THIN FILMS-Reference-Cited by-同舟云学术

INFLUENCE OF PLASMA PRETREATMENT IN THE FORMATION OF DIAMOND-LIKE CARBON THIN FILMS

Published:2009-12 Issue:06 Volume:16 Page:881-886
ISSN:0218-625X
Container-title:Surface Review and Letters
language:en
Short-container-title:Surf. Rev. Lett.

Author:

MAHESWARAN R.¹,RAMASWAMY SHIVARAMAN²,MAHAPATRA OJAS²,RAO B. PURNACHANDRA¹,GOPALAKRISHNAN C.²,THIRUVADIGAL D. JOHN¹

Affiliation:

1. Center for Materials Science and Nanodevices, Department of Physics, SRM University, Kattankulathur-603 203, India

2. Nanotechnology Research Center, SRM University, Kattankulathur-603 203, India

Abstract

Plasma-enhanced chemical vapor deposition has been used to synthesize diamond-like carbon (DLC) thin films. High purity argon and methane gases were used as precursors for the fabrication of the DLC films. The influence of plasma pretreatment on the growth of the DLC films has been studied by subjecting one of the substrates to plasma pretreatment prior to deposition of the DLC films, while maintaining the other substrate as the control. The structural properties of the DLC films have been characterized using atomic force microscopy and Raman spectroscopy. The film grown on the pretreated substrate shows a more uniform coating as compared to the film grown on non-pretreated silicon substrate. The results are discussed based on diffusivity of carbon on silicon and the effect of the plasma pretreatment.

Publisher

World Scientific Pub Co Pte Lt

Subject

Materials Chemistry,Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics

Link

https://www.worldscientific.com/doi/pdf/10.1142/S0218625X09013426

Reference18 articles.

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