Affiliation:
1. Advanced Light Source, Lawrence Berkeley National Laboratory, Berkeley, California 94720, USA
Abstract
A new undulator beamline at the Advanced Light Source, Lawrence Berkeley National Laboratory is described. This new beamline has an Apple II type undulator which produces linearly and elliptically polarized X-rays. A high resolution monochromator directs the radiation to two branchlines. The first branchline is optimized for spectroscopy and accommodates multiple endstations simultaneously. The second branchline features a photoemission electron microscope. A novel feature of the beamline is the ability to produce linearly polarized radiation at arbitrary, user-selectable angles. Applications of the new beamline are also described.
Publisher
World Scientific Pub Co Pte Lt
Subject
Materials Chemistry,Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics
Cited by
19 articles.
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