Fabrication of Variable Capacitor by Thin Copper Film with Electroplating-Reference-Cited by-同舟云学术

Fabrication of Variable Capacitor by Thin Copper Film with Electroplating

Published:2003-04-10 Issue:08n09 Volume:17 Page:2001-2004
ISSN:0217-9792
Container-title:International Journal of Modern Physics B
language:en
Short-container-title:Int. J. Mod. Phys. B

Author:

Seo Chang Taeg¹²,Lee Jae Ho³,Lee Jong Hyun³,Bae Young Ho²

Affiliation:

1. School of electronic engineering, Kyungpook National University, Daegu, Korea

2. Division of Information and Electronics, Uiduk University, Gyeongju, Korea

3. School of electronic engineering, Kyungpook Nat'l University, Daegu, Korea

Abstract

The tunable capacitors have been fabricated by copper electroplating and MEMS(Micro-Electro-Mechanical Systems) technology. The thickness of electroplated copper which is used for moving electrode for variable capacitor below 0.5μm for lower actuation voltage. The fabricated tunable capacitors have been tested from 0V~42V and the resulting tuning range was between 62.3% and 90.2%. Also, the error rates have been presented ± 2.7% below.

Publisher

World Scientific Pub Co Pte Lt

Subject

Condensed Matter Physics,Statistical and Nonlinear Physics

Link

https://www.worldscientific.com/doi/pdf/10.1142/S0217979203020016

Reference2 articles.

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1. Phase transformation of Ni/Si thin films induced by nanoindentation and annealing;Applied Physics A;2010-05-06

2. An investigation of nanoindentation tests on the single crystal copper thin film via an atomic force microscope and molecular dynamics simulation;Proceedings of the Institution of Mechanical Engineers, Part C: Journal of Mechanical Engineering Science;2007-02-01