INVESTIGATION ON OPTICAL EMISSION SPECTRA DURING ECR PLASMA ENHANCED MAGNETRON SPUTTERING CARBON NITRIDE FILM DEPOSITION

Abstract

Emission spectra from the ECR plasma enhanced magnetron sputtering discharge used for CNx film deposition were investigated in the wavelength range 350 – 550 nm. The optical emission spectra from both the negative glow discharge zone near the target surface and the plasma zone formed by ECR discharge and magnetron discharge were studied separately. The dominant chemical species in both zone were found to be N2+, N2* , and CN radicals. But the intensity of CN radical in the plasma zone was greater than that in the negative zone, where an emission band of C2 was detected. The dependence of the intensities of CN band on the working gas pressure was investigated, and the formation of CN radicals, which could be vital in the CNx film deposition process, was discussed. It was shown that a possible mechanism could be the reaction of N2+ and N 2 with C 2 in the gas phase.