Process optimization of pulse-assisted chemical deposition of Ni–P coating

Abstract

In this study, the problems of the low deposition rate and bath instability in chemical deposition can be effectively solved by using the pulsed current-assisted chemical deposition process when preparing Ni–P alloy coating. Orthogonal experiments were designed by changing the average current density, pulse frequency and duty ratio of the pulses to study their effects on the deposition rate and hardness of the coatings. Compact Ni–P coating with uniform surface morphology and good performance was prepared by parameter optimization. The results show that our method can greatly improve the deposition rate while ensuring the surface quality and performance of the deposited layer.