MEASUREMENT OF GERMANIUM ESCAPE PEAKS IN PIXE SPECTRA RECORDED USING HIGH PURITY Ge (HPGe) DETECTOR

Author:

KUMAR SANJIV1,REDDY G. L. N.1,RAJU V. S.1

Affiliation:

1. National Centre for Compositional Characterization of Materials, Bhabha Atomic Research Centre, ECIL Post, Hyderabad 500062, India

Abstract

This paper deals with studies on Ge K α and K β escape peaks in particle induced X-ray emission (PIXE) spectra recorded by a high purity germanium (HPGe) detector. A knowledge of the energies and intensities of these escape peaks is desirable for accurate qualitative as well as quantitative analysis of elements by PIXE. The spectral interferences caused by Ge K escape peaks in the determination of Fe in U by PIXE are highlighted for illustration. A simple theoretical approach based on the production of Ge K X-rays inside the Ge crystal of the detector during the process of detection of the incident characteristic X-rays and the subsequent escape of a fraction of the produced radiations from the crystal, is described to calculate the intensity ratio of the Ge escape peak to its parent characteristic X-rays. The calculated values are in agreement with the experimental values and those estimated using the formulation provided in GUPIX software for PIXE. The Ge K escape peaks are very prominent; the intensities of Ge K α escape peaks, from bromine to silver, range from 15% to 6% of those of their respective K α X-rays. These intensities are, in general, considerably higher compared to those of Si escape peaks in spectra recorded by Si ( Li ) detector. Ge K escape peaks therefore may give rise to severe interferences. The present approach provides a precise (~8%) determination of the intensity of an escape peak and thereby facilitates a reliable PIXE analysis.

Publisher

World Scientific Pub Co Pte Lt

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