A FRACTAL MODEL FOR THE FIRST STAGES OF THIN FILM GROWTH-Reference-Cited by-同舟云学术

A FRACTAL MODEL FOR THE FIRST STAGES OF THIN FILM GROWTH

Published:1996-09 Issue:03 Volume:04 Page:321-329
ISSN:0218-348X
Container-title:Fractals
language:en
Short-container-title:Fractals

Author:

JENSEN PABLO¹,BARABÁSI ALBERT-LÁSZLÓ²,LARRALDE HERNÁN³,HAVLIN SHLOMO⁴,EUGENE STANLEY H.⁵

Affiliation:

1. Départment de Physique des Matériaux, Université Claude Bernard Lyon-1, 69622 Villeurbanne Cedex, France

2. University of Notre Dame, Department of Physics, Notre Dame, IN 46556, USA

3. Physics Department, Cavendish Laboratory, Cambridge University, Madingley Road, Cambridge CB3 0HE, England

4. Physics Department, Bar Ilan University, Ramat Gan, Israel

5. Center for Polymer Studies and Department of Physics, Boston University, Boston, MA 02215, USA

Abstract

In this paper, we briefly review a model that describes the diffusion-controlled aggregation exhibited by particles as they are deposited on a surface. This model allows us to understand many experiments of thin film deposition. In the Sec. 1, we describe the model, which incorporates deposition, particle and cluster diffusion, and aggregation. In Sec. 2, we study the dynamical evolution of the model. Finally, we analyze the effects of small cluster mobility and show that the introduction of cluster diffusion dramatically affects the dynamics of film growth. Some of these effects can be tested experimentally.

Publisher

World Scientific Pub Co Pte Lt

Subject

Applied Mathematics,Geometry and Topology,Modeling and Simulation

Link

https://www.worldscientific.com/doi/pdf/10.1142/S0218348X96000431

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