Abstract
AbstractUnderstanding the sequence-dependent DNA damage formation requires to probe a complete pool of sequences over a wide dose range of the damage causing exposure. We used high throughput sequencing to simultaneously obtain the dose dependence and quantum yields for oligonucleotide damages for all possible 4096 DNA sequences with hexamer length. We exposed the DNA with ultraviolet radiation at 266 nm and doses of up to 500 photons per base. At the dimer level our results confirm existing literature values, whereas we now quantified the susceptibility of sequence motifs to UV irradiation up to previously inaccessible polymer lengths. This revealed the protective effect of the sequence context in preventing the formation of UV-lesions. For example, the rate to form dipyrimidine lesions is strongly reduced by nearby guanine bases. Our results provide a complete picture of the sensitivity of oligonucleotides to UV irradiation and allow to predict their survival chances in high-UV environments.
Publisher
Cold Spring Harbor Laboratory
Reference46 articles.
1. Effects of UV and visible radiation on DNA-final base damage;Biological Chemistry,1997
2. The ultraviolet photochemistry of thymidylyl-(3′→5′)-thymidine;J Mol Biol,1964
3. KINETICS OF DIMER FORMATION AND PHOTOHYDRATION IN ULTRAVIOLET-IRRADIATED POLYURIDYLIC ACID;Photochem Photobiol,1963
4. Photochemistry of model oligo-and polynucleotides VI. Photodimerization and its reversal in thymine dinucleotide analogues;Biochimica et Biophysica Acta (BBA) - Specialized Section on Nucleic Acids and Related Subjects,1962
5. Quantum Yield of Cyclobutane Pyrimidine Dimer Formation Via the Triplet Channel Determined by Photosensitization;The journal of physical chemistry. B,2016
Cited by
2 articles.
订阅此论文施引文献
订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献