Application of plasma assisted chemical vapor deposition and oxidation processes to fabricate semiconductor nonvolatile memory devices.
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Published:1984
Issue:10
Volume:
Page:1600-1607
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ISSN:2185-0925
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Container-title:NIPPON KAGAKU KAISHI
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language:en
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Short-container-title:NIPPON KAGAKU KAISHI
Author:
MIYAKE Hideharu,SUGANO Takuo
Publisher
The Chemical Society of Japan
Subject
General Chemistry