Efficient Decomposition of NO2into N2and O2by 193-nm ArF Laser in N2Atmosphere
Author:
Publisher
The Chemical Society of Japan
Subject
General Chemistry
Reference9 articles.
1. N2O removal in N2 or air by ArF excimer laser photolysis at atmospheric pressure
2. The photolysis of NO2 at 193 nm
3. The photochemistry of ozone at 193 and 222 nm
4. Fluorescence lifetime and collisional quenching of the predissociative NO B 2Π(ν′ = 7) state
5. VUV fluorescence following photodissociation of N2O at 193 nm
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1. Photochemical Removal of N2O in N2or Air Using 172 nm Excimer Lamps;Japanese Journal of Applied Physics;2009-04-20
2. Photochemical removal of NO2 by using 172-nm Xe2 excimer lamp in N2 or air at atmospheric pressure;Journal of Hazardous Materials;2009-03
3. Photochemical Removal of NO, NO2, and N2O by 146 nm Kr2Excimer Lamp in N2at Atmospheric Pressure;Bulletin of the Chemical Society of Japan;2009-02-15
4. Photochemical Removal of SO2and CO2by 172 nm Xe2and 146 nm Kr2Excimer Lamps in N2or Air at Atmospheric Pressure;Japanese Journal of Applied Physics;2008-12-19
5. Efficient Conversion of NO2into N2and O2in N2or into N2O5in Air by 172-nm Xe2Excimer Lamp at Atmospheric Pressure;Chemistry Letters;2007-03-05
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