EDS quantification of light elements using osmium surface coating
Author:
Affiliation:
1. Geodynamics Research Center, Ehime University
Publisher
Japan Association of Mineralogical Sciences
Subject
Geology,Geophysics
Link
https://www.jstage.jst.go.jp/article/jmps/110/4/110_141126/_pdf
Reference15 articles.
1. Akahori, H., Handa, M., Yoshida, H. and Kozuka, Y. (2000) Osmium–metal coating device using hollow–cathode plasma CVD method. Journal of Electron Microscopy, 49, 735–744.
2. Bastin, G.F. and Heijligers, H.J.M. (1991) Nonconductive specimens in the electron probe microanalyzer — a hitherto poorly discussed problem. In Electron probe quantitation (Heinrich, K.F.J. and Newbury, D.E. Eds.). pp. 400, Plenum Press, New York, 163–175.
3. Bizouard, H. and Charpentier, F. (1979) Essai d’analyse du carbone et de l’oxygéne dans les minéraux. Journal de Microscopie et de Spectroscope Électroniques, 4, 149–162.
4. Chantler, C.T. (1995) Theoretical form factor, attenuation and scattering tabulation for Z = 1–92 from E = 1–10 eV to E = 0.4–1.0 MeV. Journal of Physical and Chemical Reference Data, 24, 71–643.
5. Duncumb, P. and Melford, D.A. (1966) In X–ray optics and microanalysis (Castaing, R., Deschamps, P. and Philibert, J. Eds.). pp. 374, Hermann, Paris, 240–253.
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