Hydrophobic functionalization of graphene oxide film by pulsed hexamethyldisiloxane plasma

Author:

Zhang Mengxing12,Guan Denggao1,Yang Haowei2,Xu Cigang2

Affiliation:

1. College of Materials and Chemistry & Chemical Engineering, Chengdu University of Technology , No.1 East 3rd Road, Erxianqiao,Chenghua District, 610059 Chengdu, Sichuan Province , P. R. China

2. Institute of Materials, China Academy of Engineering Physics , Mianyang, 621908 Sichuan , P. R. China

Abstract

Abstract Graphene oxide (GO) membranes show good separation performance in membrane distillation processes, which require at least a single-sided hydrophobic surface to resist liquid penetration, but such hydrophobic GO membrane cannot be facilely prepared by conventional wet chemical processes. Here, a pulsed plasma hexamethyldisiloxane (HMDSO) process was investigated, with the highest surface contact angle of 124° obtained. The results demonstrate that a plasma deposition process can provide a proper route to prepare surface-selective hydrophobic GO films, which facilitates their applications for membrane distillation processes and related fields.

Funder

Sichuan Science and Technology Program

China Academy of Engineering Physics, P. R. China

Publisher

Oxford University Press (OUP)

同舟云学术

1.学者识别学者识别

2.学术分析学术分析

3.人才评估人才评估

"同舟云学术"是以全球学者为主线,采集、加工和组织学术论文而形成的新型学术文献查询和分析系统,可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容,当前同舟云学术共收录了国内外主流学术期刊6万余种,收集的期刊论文及会议论文总量共计约1.5亿篇,并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询!咨询电话:010-8811{复制后删除}0370

www.globalauthorid.com

TOP

Copyright © 2019-2024 北京同舟云网络信息技术有限公司
京公网安备11010802033243号  京ICP备18003416号-3