In situ pump-flow-probe XAFS study of photoexcited electron transfer over single atom-Pt/CoOOH photocatalysts

Author:

Cheng Weiren1,Kido Daiki2,Niwa Yasuhiro2,Bo Shuowen13,Kimura Masao2,Ota Ryo4,Shibayama Tamaki4,Asakura Kiyotaka1

Affiliation:

1. Institute for Catalysis, Hokkaido University , Kita 21, Nishi 10, Kita-ku, Sapporo, Hokkaido 001-0021 , Japan

2. Photon Factory, Institution of Materials Structure Science, High Energy Accelerator Research Organization (KEK) , 1-1 Oho Tsukuba, Ibaraki 305-0801 , Japan

3. National Synchrotron Radiation Laboratory, University of Science and Technology of China , Hezuohua Road, Baohe District, Hefei 230029, Anhui , P. R. China

4. Center for Advanced Research of Energy and Environment, Faculty of Engineering Hokkaido University , Kita 13, Nishi 8, Kita-ku, Sapporo, Hokkaido 001-0013 , Japan

Abstract

Abstract We applied pump-flow-probe X-ray absorption fine structure (PFP-XAFS) spectroscopy to photoexcited electron transfer from semiconductor to cocatalyst in a single atom(SA)-Pt/CoOOH photocatalyst to trace the process with microsecond (μs) time resolution. Upon photoirradiation, photoexcited electrons in the CoOOH semiconductor are found to transfer into Pt 5d orbitals, reaching a maximum population at 10 μs delay time. The accumulation of photoelectrons in the Pt 5d and the following decay process are reasonably explained by sequential first-order kinetics with rate constants of k1 = 0.11 ± 0.03 μs−1 and k2 = 0.06 ± 0.01 μs−1.

Funder

Grants-in-Aid for Scientific Research JSPS Fellows

JSPS Early-Career Scientists

Publisher

Oxford University Press (OUP)

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