Optimizing Electron Ptychography for Advanced Characterization of Soft/Hard Interfaces-Reference-Cited by-同舟云学术

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Optimizing Electron Ptychography for Advanced Characterization of Soft/Hard Interfaces

Published:2024-07 Issue:Supplement_1 Volume:30 Page:
ISSN:1431-9276
Container-title:Microscopy and Microanalysis
language:en
Short-container-title:

Author:

Reis Roberto dos¹²³,Hu Xiaobing¹²,Stroppa Daniel G⁴,Dravid Vinayak¹²³

Affiliation:

1. Department of Materials Science and Engineering, Northwestern University , Evanston, IL , USA

2. The NUANCE Center, Northwestern University , Evanston, IL , USA

3. International Institute of Nanotechnology, Northwestern University , Evanston, Illinois , USA

4. DECTRIS AG, Baden-Daetwill , Switzerland

Publisher

Oxford University Press (OUP)

Link

https://academic.oup.com/mam/article-pdf/30/Supplement_1/ozae044.946/58670484/ozae044.946.pdf

Reference4 articles.

1. Making the most of your electrons: Challenges and opportunities in characterizing hybrid interfaces with STEM

2. State of the Art and Prospects in Metal–Organic Framework (MOF)-Based and MOF-Derived Nanocatalysis

3. The Chemistry and Applications of Metal-Organic Frameworks

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