1. Metal Silicides in CMOS Technology: Past, Present, and Future Trends
2. Kuzmichev A.I., Magnetron sputtering systems/Ki.1.Introduction to the physics and technology of magnetron sputtering (K. Avers, 2008)
3. Khozhiev Sh.T., Kosimov I.O., Gaibnazarov B.B., Bohodirzhonova A.B., Titanium oxide and its features manifested by powder x-ray diffractometry, Novateur Publications, Pune, Maharashtra, India Journal NX- A Multidisciplinary Peer Reviewed Journal ISSN: 2581-4230, May 25th-26th 550 (2021)