Nickel Thin Films Grown by MOCVD Using Ni(dmg)2 as Precursor
Author:
Publisher
EDP Sciences
Subject
General Physics and Astronomy
Link
http://jp4.journaldephysique.org/10.1051/jphyscol:1995553/pdf
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1. Chemical vapour deposition (CVD) of nickel oxide using the novel nickel dialkylaminoalkoxide precursor [Ni(dmamp′)2] (dmamp′ = 2-dimethylamino-2-methyl-1-propanolate);RSC Advances;2021
2. Synthesis of emerging 2D layered magnetic materials;Nanoscale;2021
3. Catalyst Enhanced Chemical Vapor Deposition of Nickel on Polymer Surface;Journal of Wuhan University of Technology-Mater. Sci. Ed.;2019-04
4. Deposition of Ni thin films from Ni(II) β-diketonates derivatives with 1,3-diaminopropane;Journal of Physics and Chemistry of Solids;2013-09
5. Precursor development, characterisation and evaluation of sublimation enthalpies of novel volatile complexes of nickel;Inorganica Chimica Acta;2009-04
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