Influence of ion bombardment on structural and electrical properties of SiO2thin films deposited from O2/HMDSO inductively coupled plasmas under continuous wave and pulsed modes-Reference-Cited by-同舟云学术

Influence of ion bombardment on structural and electrical properties of SiO2thin films deposited from O2/HMDSO inductively coupled plasmas under continuous wave and pulsed modes

Published:2008-03-28 Issue:1 Volume:42 Page:3-8
ISSN:1286-0042
Container-title:The European Physical Journal Applied Physics
language:
Short-container-title:Eur. Phys. J. Appl. Phys.

Author:

Bousquet A.,Goullet A.,Leteinturier C.,Coulon N.,Granier A.

Publisher

EDP Sciences

Subject

Condensed Matter Physics,Instrumentation,Electronic, Optical and Magnetic Materials

Link

http://www.epjap.org/10.1051/epjap:2008038/pdf

Reference23 articles.

1. Organic electronics: Introduction

2. New challenges in thin film transistor (TFT) research

3. Plasma modification of polycarbonates

4. Measurements of pulsed‐power modulated argon plasmas in an inductively coupled plasma source

5. Evolution of ion and electron energy distributions in pulsed helicon plasma discharges

Cited by 4 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Hybrid approaches coupling sol–gel and plasma for the deposition of oxide-based nanocomposite thin films: a review;SN Applied Sciences;2021-05-27

2. The effects of thermal annealing on the structural and electrical properties of zinc tin oxide thin films for transparent conducting electrode applications;Physica B: Condensed Matter;2019-04

3. Plasma Enhanced-Chemical Vapor Deposited Polymers: Plasma Phase Reactions, Plasma-Surface Interactions, and Film Properties;CVD Polymers;2015-08-20

4. Investigation of Electron Cyclotron Resonance Chemical Vapor Deposition Process for a-Si:H Deposition, Film Characterization and In Situ Plasma Diagnostics;ECS Journal of Solid State Science and Technology;2015