In situ diagnostic of etch plasmas for process control using quantum cascade laser absorption spectroscopy
Author:
Publisher
EDP Sciences
Subject
Condensed Matter Physics,Instrumentation,Electronic, Optical and Magnetic Materials
Link
http://epjap.epj.org/10.1051/epjap/2009198/pdf
Reference5 articles.
1. Diagnostic studies of molecular plasmas using mid-infrared semiconductor lasers
2. N. Lang, J. Röpcke, A. Steinbach, S. Wege, IEEE Trans. Plasma Sci.37(Part 2) (2009)
3. In Situ Monitoring of Silicon Plasma Etching Using a Quantum Cascade Laser Arrangement
4. Fundamentals and limitations of large area planar microwave discharges using slotted waveguides
5. http://webbook.nist.gov/chemistry/form-ser.html
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