Angular distribution of particles sputtered from the vanadium target by 5 keV Kr ions: simulation study

Abstract

The sputtering of vanadium particles at normal incidence was simulated. The SRIM-code combined to a new ANGULAIR and SDTrimSP simulation was employed to obtain the sputtering yields and the angular distribution of the atoms. The simulation was made for a large number of incident Kr+ ions with 5 keV energy, letting the computer count the number of emitted particles in the solid angle. The angular distribution of differential sputtering yields of vanadium shows an over-cosine tendency.