Fabrication and characterization of graphene induced Metal Semiconductor Metal (MSM) structure for detection and sensing applications
-
Published:2021-01
Issue:1
Volume:93
Page:10503
-
ISSN:1286-0042
-
Container-title:The European Physical Journal Applied Physics
-
language:
-
Short-container-title:Eur. Phys. J. Appl. Phys.
Author:
Alam Shoaib,Shuja Ahmed,Jamil Erum,Siddique Faryal,Siddiqui Ali Raamiz
Abstract
The demand for miniaturization of electronic devices has lent to the development of graphene-based hybrid structures, which include the Metal-Semiconductor-Metal (MSM) device. In this work, one has developed such a device by growing monolayers of graphene on top of Nickel to form the basic structural matrix. Four different variants of the MSM unit structures have been developed to assess their potential in next generation electronics. The presence of graphene in the original matrix was confirmed via Atomic Force Microscopy, and the optical response of the graphene layer was further studied using Spectroscopic Ellipsometry in UV-Vis-NIR regime; Forouhi-Bloomer model was used to analyze the ellipsometry data. Hall effect and other electrical characterization measurements were conducted to analyze the electrical properties of the fabricated devices.
Subject
Condensed Matter Physics,Instrumentation,Electronic, Optical and Magnetic Materials
Reference29 articles.
1. Future of nano CMOS technology
2. Mayberry M., National Institute of Standards and Technology Report No. 5375, 2013 (unpublished)
3. Mobility Enhancement Technology for Scaling of CMOS Devices: Overview and Status
4. Bohr M., in Proceedings of the International Electron Devices Meeting (IEDM), Washington, 2011
5. Aghdam F.F., Liao H., in Proceedings of Reliability and Maintainability Symposium, Orlando, 2017