Modeling, optimization and characterization of titanium dioxide thin film prepared by the spin-coating method using the experimental design for an application of photocatalytic degradation of methylene blue

Author:

Sadek Otmane,Touhtouh Samira,Rkhis Mourad,El Jouad Mohamed,Belhora Fouad,Hajjaji Abdelowahed

Abstract

This work focuses on modeling and optimizing the deposition of a TiO2 film on ITO glass using the spin-coating method and experimental design. The parameters studied include the concentration of the solution, speed and duration of rotation, drying temperatures and time, and calcination temperature and time. Results show that optimal conditions are achieved at 457 g/l concentration, 1020 rpm speed, 43 s duration of rotation, 100 °C drying temperature for 30 s, and 500 °C calcination temperature for 2 h. XRD, FTIR, EDX, and SEM analyses of the TiO2/ITO film indicate crystallization in the anatase phase with a 29.3 nm crystal size and around 80% deposition quality, with good surface adhesion and a thickness of approximately 30 nm. The photocatalytic activity of the thin film for the decomposition of methylene blue (MB) in water was also studied. Results showed a 70% degradation of MB after 4.5 h, which was confirmed by absorption spectra and discoloration of MB. Additionally, the degradation reaction of MB by TiO2 followed the pseudo-first-order, with good agreement between the kinetic study and a high degradation rate constant (k1deg = 0.2919 (h−1)), indicating a rapid process. Finally, a photodegradation mechanism of MB was reported.

Publisher

EDP Sciences

Subject

Condensed Matter Physics,Instrumentation,Electronic, Optical and Magnetic Materials

同舟云学术

1.学者识别学者识别

2.学术分析学术分析

3.人才评估人才评估

"同舟云学术"是以全球学者为主线,采集、加工和组织学术论文而形成的新型学术文献查询和分析系统,可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容,当前同舟云学术共收录了国内外主流学术期刊6万余种,收集的期刊论文及会议论文总量共计约1.5亿篇,并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询!咨询电话:010-8811{复制后删除}0370

www.globalauthorid.com

TOP

Copyright © 2019-2024 北京同舟云网络信息技术有限公司
京公网安备11010802033243号  京ICP备18003416号-3