Morphology, electrical & optical properties of BaO thin films deposited by PVD

Abstract

In this work, we explore a new experimental study of Barium oxide (BaO) thin films, fabricated using the physical vapor deposition (PVD) technique on both glass and silicon substrates. The BaO thin films have emerged as highly adaptable materials with immense potential across multiple technological domains. The investigation focuses on the morphological, optical, and electrical properties of BaO thin films to determine their potential for various applications. These films, consistently tailored to a thickness of 100 nm, exhibit exceptional optical properties, boasting an impressive transmittance rate of up to 90%. This makes them exceptionally well-suited for applications that demand superior optical transmission, such as flat-panel displays, photovoltaic devices, and various optoelectronic applications. The films’ low roughness values, measured at 6.31 nm for glass-deposited films and 13.32 nm for silicone-deposited ones, underscore their uniformity, ensuring stable and precise performance control in diverse applications. Further underscoring their versatility is the wide energy gap of 2.93 eV, suggesting their potential utility in advanced optoelectronic devices that require higher energy levels. In addition to their optical prowess, BaO thin films exhibit impressive electrical resistance, measuring at 3.3 × 108 ohms, rendering them promising candidates for specialized applications, including pressure and humidity sensors, as well as electrical insulation devices. Overall, these films represent an exciting avenue for addressing specific technological needs and driving innovation in the realm of thin film technology.