Implantation of gold atoms into silicon by MeV electron irradiation-Reference-Cited by-同舟云学术

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Implantation of gold atoms into silicon by MeV electron irradiation

Published:1993 Issue:2-3 Volume:4 Page:137-142
ISSN:1154-2799
Container-title:Microscopy Microanalysis Microstructures
language:
Short-container-title:Microsc. Microanal. Microstruct.

Author:

Mori Hirotaro,Sakata Takao,Komatsu Masao,Yasuda Hidehiro

Publisher

EDP Sciences

Subject

Instrumentation

Link

http://mmm.edpsciences.org/10.1051/mmm:0199300402-3013700/pdf

Reference10 articles.

Cited by 6 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. The importance of ultra-high voltage electron microscopy in materials science;Proceedings of the Japan Academy, Series B;2005

2. Implantation of Au atoms into Al matrix by MeV electron irradiation;Journal of Electron Microscopy;2002-03-27

3. The importance and applications of ultra-high voltage electron microscopy to materials science;Journal of Electron Microscopy;1999-01-01

4. Electron Channeling at Ultra-High Voltages and Its Applications to Materials Science;Materials Transactions, JIM;1996

5. Analysis of bonding state in pure and gold-implanted amorphous SiC by a combination of UHVEM and AES;Journal of Microscopy;1995-10

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