Atmospheric pressure chemical vapour deposition of chromium oxide films
Author:
Publisher
EDP Sciences
Subject
General Physics and Astronomy
Link
http://jp4.journaldephysique.org/10.1051/jp4:1999848/pdf
Cited by 6 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. Plasma enhanced chemical vapor deposition of Cr2O3 thin films using chromium hexacarbonyl (Cr(CO)6) precursor;Thin Solid Films;2008-09
2. Chromium oxyselenide solid solutions from the atmospheric pressure chemical vapour deposition of chromyl chloride and diethylselenide;Journal of Materials Chemistry;2008
3. Synthesis and Charaterisation of Chromium Oxyselenide (Cr 2 Se 0.7 O 2.3 ) Formed from Chemical Vapour Synthesis: A New Antiferromagnet;European Journal of Inorganic Chemistry;2007-09-25
4. A Comparative Study of Cr2O3 Thin Films Obtained by MOCVD using Three Different Precursors;Chemical Vapor Deposition;2005-09
5. Atmospheric pressure chemical vapour deposition of Cr2−xTixO3(CTO) thin films (≤3 µm) on to gas sensing substrates;J. Mater. Chem.;2003
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