CVD induced by ion beams for the preparation of oxide and nitride thin films
Author:
Publisher
EDP Sciences
Subject
General Physics and Astronomy
Link
http://jp4.journaldephysique.org/10.1051/jp4:1999888/pdf
Cited by 5 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. Electrical characteristics of mixed Zr–Si oxide thin films prepared by ion beam induced chemical vapor deposition at room temperature;Thin Solid Films;2009-07
2. Optical refractive index and static permittivity of mixed Zr–Si oxide thin films prepared by ion beam induced CVD;Thin Solid Films;2007-12
3. Size and shape of supported zirconia nanoparticles determined by x-ray photoelectron spectroscopy;Journal of Applied Physics;2007-06-15
4. Angle dependence of the O K edge absorption spectra of TiO2 thin films with preferential texture;Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms;2003-01
5. Structural modifications produced by the incorporation of Ar within the lattice of Fe2O3 thin films prepared by ion beam induced chemical vapour deposition;Acta Materialia;2000-12
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