Laser Energies Effects on Physical Properties of CuO₂ Nano-Structures

Abstract

A single-step of pulsed laser deposition method was used to manufacture (Cu2O) cuprous oxide nanothin films on Silicone substrates at low growing temperature in this study. The effects of three parameters of pulsed laser energies (800-1200 mJ) was used to explored in order to maximize the structural and morphological quality. (XRD) X-ray diffraction, Scanning electron microscopy with field emission (FESEM), and Atomic force microscopy were used to evaluate the effects of laser pulsed energies on the characteristics of Cu2O nanofilms (FESEM). When compared to a crystalline silicon surface, the results of AFM show a higher possibility of better absorption and hence lower reflection.