Fabrication and Characterization of Nano-Structured ZnS:Cu LED

Abstract

A wide range of Light Emitting Diodes (LEDs) applications, from general lighting to transmission sources of the Visual Light Communication (VLC) system, makes the LEDs very important to be developed. This research focuses on comparing LED performance due to the variation in surface size and shape of the LED. The research method is carried out with a simulation and an experimental approach. Before the experiment, the LED was simulated with nanopattern variations to determine the best fabrication parameter. The simulation method is carried out using Ansys Lumerical FDTD 2021. The experiment method used to fabricate nanopatterns on the surface of a semiconductor LED layer uses the nanoimprint lithography method. Stamps for nanoimprint lithography are made using Polydimethylsiloxane (PDMS), and the nanopattern sources are obtained from DVD and Blu-ray grating patterns. The characterization of nanoscale patterns was carried out using a Scanning Electron Microscope (SEM). The light emission intensity is measured using a lux meter at a series of emission angles. The results obtained from this research are that the smaller the width and the periodicity of the grating nanopattern, the light produced will be distributed at a wider angle, but the light intensity will decrease; conversely, for a planar surface without a grating nanopattern, level of focus and intensity of light will be higher. In addition, the thicker the ZnS:Cu layer, the better the intensity of the light produced.