Substrate Bias Effects on the Structure of the Film by a Hybrid PVD and Plasma-Based Ion Implantation Process

Abstract

This paper descirbes the characteristics of gold films prepared by a hybrid plasma based an ion implantation/deposition (PBIID) system. The surface morphology and structure of the film were affected by the voltage applied to the target. With increasing negative voltage, the surface became thinner with a lesser number of nuclei. The grain structure varied from the continuous film at 0 kV to the channel at -1 kV, and further to the islands (mounds) at -5 kV. The ions in the sheath are believed to play an important role in the deposition of the film.