Wettability and Durability of Si-O Coatings on Zirconia Substrate by RF-Magnetron Plasma Sputtering

Abstract

The wettability and durability of Si-O coatings prepared on zirconia substrate using radiofrequency magnetron sputtering (rf-sputtering) was studied. XRD analysis revealed no phase transformation of zirconia before/after rf-sputtering process. XPS spectroscopy showed that as-deposited films with a SiO2configuration was formed. EDX analysis indicated that the Si/Zr ratio was high and when magnetron rf-sputtering was performed using a plasma gas Ar+5% O2, which may be the optimum condition of rf-sputtering to form a sustainable hydrophilic layer on zirconia substrate. The wear testing using pin on disc wear apparatus was performed. The wettability and durability of Si-O coatings fabricated by magnetron radiofrequency magnetron sputtering (rf-sputtering) on zirconia substrate was studied. A plasma gas Ar+5% O2may be the optimum condition of rf-sputtering to form a sustainable hydrophilic layer on zirconia substrate