Current and Potential Uses of Positron Beams to Study Porosity in Low-k Dielectric Thin Films-Reference-Cited by-同舟云学术

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Current and Potential Uses of Positron Beams to Study Porosity in Low-k Dielectric Thin Films

Published:2001-04 Issue: Volume:363-365 Page:15-19
ISSN:1662-9752
Container-title:Materials Science Forum
language:
Short-container-title:MSF

Author:

Rodbell K.P.¹,Petkov M.P.²,Weber Marc H.²,Lynn Kelvin G.²,Volksen W.³,Miller Robert D.³

Affiliation:

1. IBM Research Division

2. Washington State University

3. IBM Almaden Research Center

Publisher

Trans Tech Publications, Ltd.

Subject

Mechanical Engineering,Mechanics of Materials,Condensed Matter Physics,General Materials Science

Link

https://www.scientific.net/MSF.363-365.15.pdf

Cited by 13 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Silica Gels: Characterization by Physical Methods;Encyclopedia of Surface and Colloid Science, Third Edition;2015-12-04

2. Positron annihilation and free volume studies in polymer glasses;Journal of Polymer Science Part B: Polymer Physics;2008-12-01

3. Depth-selective 2D-ACAR studies on low-k dielectric thin films;Radiation Physics and Chemistry;2003-10

4. Systematic positron study of hydrophilicity of the internal pore surface in ordered low-k silica thin films;Materials Science and Engineering: B;2003-09

5. Positron beam analysis of structurally ordered porosity in mesoporous silica thin films;Materials Science and Engineering: B;2003-09

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