Growth of ZnO Thin Films by Metalorganic Chemical Vapor Deposition Using Isopropyl Alcohol for Oxygen Precursor-Reference-Cited by-同舟云学术

Growth of ZnO Thin Films by Metalorganic Chemical Vapor Deposition Using Isopropyl Alcohol for Oxygen Precursor

Published:2006-03 Issue: Volume:510-511 Page:998-1001
ISSN:1662-9752
Container-title:Materials Science Forum
language:
Short-container-title:MSF

Author:

Park Jae Young¹,Hong Yong Sung¹,Kim Sang Sub¹

Affiliation:

1. Chonnam National University

Abstract

ZnO thin films were synthesized by metalorganic chemical vapor deposition on Al2O3 (0001) substrates particularly using isopropyl alcohol for oxygen precursor. Change in microstructure was investigated depending on the growth temperature and the O/Zn precursor ratio. Under an optimized condition, ZnO thin films having a very smooth surface and dense cross-sectional microstructure were obtained while possessing epitaxial crystalline alignment. However, the photoluminescent spectrum lacks the band-edge emission.

Publisher

Trans Tech Publications, Ltd.

Subject

Mechanical Engineering,Mechanics of Materials,Condensed Matter Physics,General Materials Science

Link

https://www.scientific.net/MSF.510-511.998.pdf

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