Affiliation:
1. Universidade Nova de Lisboa
2. CEFITEC
Abstract
Ni-Ti thin films where the R-phase transformation occurs between 55°C and 30°C, the
peak temperature being 40°C, have been produced. These thin films have been grown using a
magnetron assisted system of dc sputtering, with a Glow-Discharge Optical Emission Spectroscopy
device. The OES technique has been used to investigate the spatial distribution of sputtered atoms
from the cathode to the substrate in different operating conditions: Argon pressure of 5 and 9x10 – 4
Torr, without polarization and with – 60 V bias. Structural characterization of the thin films has
been made by XRD and the transformation temperatures associated to the shape memory effect
have been determined by DSC. A discussion of the optimization of the processing parameters
(Argon pressure and polarization) is then presented.
Publisher
Trans Tech Publications, Ltd.
Subject
Mechanical Engineering,Mechanics of Materials,Condensed Matter Physics,General Materials Science
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