The Study of SiC Thin Films Produced by Magnetron Sputtering

Author:

Lai Lei1,Wang Xiao Jia2,Hao Jun Jie1

Affiliation:

1. University of Science and Technology Beijing

2. Sichuan Renzhi Petrochemical Technology Co., Ltd.

Abstract

In this paper, SiC films were deposited on the surface of 316L stainless steel by magnetron sputtering with sintering SiC target to improve its wear resistance. The structure and morphologies of the SiC films were characterized by XRD and SEM. The impacts of sputtering way, deposition time, and substrate temperature on the deposition rate and mechanical properties of SiC films were further investigated by the performance parameters of hardness, elastic modulus, friction and wear properties, coating adhesion, etc. The results show that coating adhesion is higher when the films are deposited by mid-frequency magnetron sputtering than that of which by direct current sputtering; Hardness and elastic modulus of the films increased gradually with the deposition time changing from 1 to 5h or the substrate temperature changing from room temperature to 200°C; However, the friction coefficient initially decreases, but turns to increase with the deposition time prolonging or the substrate temperature rising. The wear resistance of the films is the best when deposition time is 2h and substrate temperature is 100°C.

Publisher

Trans Tech Publications, Ltd.

Subject

Mechanical Engineering,Mechanics of Materials,General Materials Science

Reference13 articles.

1. Y. Hao, J. Peng, Y.T. Yang, SiC wide-band-gap semiconductor technology, Science Press, Beijing, (2000).

2. P.J. Kelly, J. Hisek, Y. Zhou, et al., Advanced Coatings Through Pulsed Magnetron Sputtering, J. Surf. Eng. 20 (2004) 157-162.

3. W. Wuhrer, A Study on the Microstructure and Property Development of DC Magnetron Co-sputtered Ternary Titanium Aluminum Nitride Coatings, Material. Sci. 37 (2002) 1993-(2004).

4. I.V. Svadkovsk, Characterisation Parameters for Unbalanced Magnetron Sputtering Systems, Vacuum. 68 (2003) 283-290.

5. R.M. Todi, A.P. Warren, K.B. Sundaram, et al., X-Ray Photoelectron Spectroscopy Analysis of Oxygen Annealed Radio Frequency Sputter Deposited SiCN Thin Films, Electrochem. Soc. 7 (2006) 640-643.

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