Electrodeposited Ni100-XFex Thin Films on Copper Substrates

Abstract

Due to their soft operational capacity and magnetic properties, Iron Nickel alloys are of great commercial interest. A simple and inexpensive technique for the production of Nickel-Iron thin films is electrodeposition. A lot of physical and chemical parameters (substrates, concentration, current density, potential, temperature, pH, agents of addition......) can significantly influence the physical properties, such as homogeneity, bright, structure and morphology of the Ni-Fe deposits. This paper presents a study into some characteristics of Ni-Fe deposits on Copper substrates. All the electrochemical experiments were performed in a three electrode cell in which the volume of the bath was 150ml. Electrodeposition of Ni-Fe was carried out potensiostatically from a Brenner type electrolytic bath in [0.1 aqueous solutions of Ni-Fe. The applied potential is-1.20V and the deposition time varies from 10 min to 30 min for all experiments.