Fabrication of Anti-Reflecting Silicon Surfaces for Solar Cells Using Ag Assisted Chemical Etching

Abstract

Antireflection of silicon surface is one key technology for manufacture of efficient solar cells. The noble metal assisted chemical etching Si wafer can quickly produce a black Si surface with a high porosity in HF-H2O2-H2O solution at room temperature. The pores formed are straight and vertical to the surface of Si. The porous Si surface exhibits a reflectivity of 2 % in the range of 200-1000 nm, which shows that this process is beneficial to improve the conversion efficiency and to decrease the cost of Si solar cells.