High Temperature Oxidation of CrAlSiN Thin Films

Abstract

Nano-multilayered, crystalline CrAlSiN thin films were deposited on either steel or WC-10%Co substrates by the cathodic arc plasma deposition. Their oxidation characteristics were studied at 800-1000°C for 50 h in air. The film deposited on steel displayed good oxidation resistance, due mainly to formation of Cr2O3 and α-Al2O3. The film deposited on WC-10%Co displayed poor oxidation resistance, due mainly to the oxidation of the substrate.